The ion source department of Beijing Jozzon Space Technology Development Co., Ltd., formerly known as "Plasma Laboratory" of Center for Space Science and Applied Research, is engaging in ion source technology research and product development. For many years, the ion source department focuses on Kaufman (K series) ion source and Hall (H series) ion source development, the product technology is mature, stable and reliable system operation, the effect is significant, and the service is guaranteed.With a large number of application cases, it has become the first choice for enterprises need of material modification and thin provisioning.

Good performance of our products:

(1) increasing the binding force and firmness between films ；
(2) Increasing refractive index and densification,reducing the drift；
(3) Generating oxygen ion, reducing the oxygen loss , so as to improve the absorption of thin films；

Above our and our product advantage and good performance fully guarantee our and our product is your right and regretless choice。

  • K6cm Ion source for cleaning and assisted deposition

    ion energy：100-600eV、100-1200eV
    ion beam：80 mA
    homogeneity range：Φ100mm
    heterogeneity：±20%
    distance(form export of ion):300mm
    working gas：Ar、N2、O2
    Installation：inner、outer
    suit for chamber：Φ300 mm-Φ500 mm

  • K8cm Ion source for cleaning and assisted deposition

    ion energy：100-600eV、100-1200eV
    ion beam:120 mA
    homogeneity range：Φ160mm
    heterogeneity：±20%
    distance(form export of ion)：300mm
    working gas：Ar、N2、O2
    Installation：inner、outer
    suit for chamber：Φ300 mm-Φ630 mm

  • K12cm Ion source for cleaning and assisted deposition

    ion energy：100-600eV、100-1200eV
    ion beam:150 mA
    homogeneity range：Φ450mm
    heterogeneity：±15%
    distance(form export of ion)：500mm
    working gas：Ar、N2、O2
    Installation：inner、outer
    suit for chamber：Φ600 mm-Φ1000 mm

  • K16cm Ion source for cleaning and assisted deposition

    ion energy：100-600eV、100-1200eV
    ion beam:450 mA
    homogeneity range：Φ800mm
    heterogeneity：±15%
    distance(form export of ion)：800mm
    working gas：Ar、N2、O2
    Installation：inner、outer
    suit for chamber：Φ1000 mm-Φ1300 mm

  • K8cm Sputtering ion source

    ion energy：1K-4KeV
    ion beam:150 mA
    homogeneity range：Φ50mm
    heterogeneity：focused beam；
    distance(form export of ion)：150-200mm
    working gas：Ar
    Installation：inner、outer
    suit for chamber：Φ300 mm-Φ800 mm

  • K15cm Sputtering ion source

    ion energy：100-1000 eV
    ion beam:100-800 mA
    homogeneity range：Φ150mm
    heterogeneity：±15%
    distance(form export of ion):150mm
    working gas：Ar
    Installation：outer
    suit for chamber：more than Φ500 mm

  • High-energy ion source

    ion energyⅠ（ev）：3-30 keV
    ion beam:20 mA
    homogeneity range：Φ100mm
    heterogeneity：±20%
    distance(form export of ion)：500mm
    working gas：Ar、N2
    Installation：outer
    suit for chamber：more than Φ500 mm

  • High-energy ion source

    ion energyⅡ（ev）：5-50keV
    ion beam:20 mA
    homogeneity range：Φ100mm
    heterogeneity：±20%
    distance(form export of ion)：500mm
    working gas：Ar、N2
    Installation：outer
    suit for chamber：more than Φ500 mm

  • H6cmHuoErYuan

    anode voltage：80-200V
    anode current：0-5A
    ion beam：1000mA
    homogeneity range：Φ50cm
    heterogeneity：±20%
    distance(form export of ion)：500mm
    working gas：Ar、O2
    cooling method ：natural cooling
    Installation：inner
    suit for chamber：Φ500-Φ800 mm

  • H8cmHuoErYuan

    anode voltage：80-200V
    anode current ：0-5A
    ion beam：1200mA
    homogeneity range：Φ65cm
    heterogeneity：±20%
    distance(form export of ion)：500mm
    working gas：Ar、O2
    cooling method ：natural cooling
    Installation：inner
    suit for chamber：Φ630-Φ1000 mm

  • H10cm HuoErYuan

    anode voltage：200V
    anode current：8A
    ion beam：2000mA
    homogeneity range：Φ100cm
    heterogeneity：±10%
    distance(form export of ion)：70mm
    working gas：Ar、O2
    cooling method ：water-cooling
    Installation：inner
    suit for chamber：more than Φ1000 mm

  • Hollow cathode electron beam bridge

    anode voltage：10-30V
    E beam：1-4A
    working life：more than 100 hours